Photoresist coating apparatus, medium, and method efficiently spraying photoresist

摘要

A photoresist coating apparatus, medium, and method for efficiently spraying a liquid photoresist to maintain an atmosphere of ionized solvent vapor between a substrate and a spray nozzle of an upper portion by using a vapor inducing pipe supplying ionized solvent vapor, with the atmosphere being maintained by differently biasing a lower portion supporting the substrate and a plate of the upper portion. Photoresist can be evenly coated over the entire surface of the substrate while reducing the loss of sprayed photoresist droplets.