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Method of manufacturing a wrap around shield for a perpendicular write pole using a laminated mask

机译:使用层压掩模制造用于垂直写入极的环绕式屏蔽物的方法

摘要

A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield that wraps around the write pole. The method allows the trailing shield to be constructed with a very well controlled trailing gap thickness and also allows the write pole to be constructed with a well controlled track width and a straight, flat trailing edge. The method includes depositing a magnetic write pole over a substrate and forming a mask structure over the write pole layer. The mask structure includes an end point detection layer that can be removed by reactive ion etching. An ion mill is performed to form a write pole by removing magnetic write pole material that is not covered by the mask layer. A layer of non-magnetic material such as alumina is deposited and is ion milled to expose the end point detection layer. The end point detection layer is then removed by reactive ion etch and a magnetic wrap around trailing shield is deposited.
机译:一种构造用于垂直磁记录的磁写头的方法,该写头具有写极,该写极具有围绕写极的尾随屏蔽。该方法允许尾随屏蔽件被构造为具有很好控制的尾随间隙厚度,并且还允许写极被构造为具有良好控制的迹线宽度和平直的尾随边缘。该方法包括在衬底上方沉积磁写入极并在写入极层上方形成掩模结构。掩模结构包括可以通过反应离子蚀刻去除的终点检测层。通过去除未被掩模层覆盖的磁性写入极材料来执行离子磨以形成写入极。沉积一层非磁性材料(例如氧化铝)并进行离子铣削,以暴露出终点检测层。然后通过反应性离子蚀刻去除端点检测层,并沉积围绕尾随屏蔽层的磁性包裹层。

著录项

  • 公开/公告号US2007245545A1

    专利类型

  • 公开/公告日2007-10-25

    原文格式PDF

  • 申请/专利权人 ARON PENTEK;YI ZHENG;

    申请/专利号US20060412038

  • 发明设计人 YI ZHENG;ARON PENTEK;

    申请日2006-04-25

  • 分类号G11B5/127;

  • 国家 US

  • 入库时间 2022-08-21 21:06:42

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