METHOD OF RECORDING AN EXPOSURE PATTERN IN A RECORDING LAYER OF A HOLOGRAPHIC MASK, METHOD OF FORMING AN EXPOSURE PATTERN IN A PHOTOSENSITIVE MATERIAL FILM, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING AN ELECTRO-OPTIC DEVICE

摘要

A method of recording an exposure pattern in a recording layer of a holographic mask, using an original reticle that has the exposure pattern formed therein, the recording method comprising: illuminating a first recording light and a first reference light to the recording layer simultaneously, the first recording light being illuminated through an original reticle placed opposite to the holographic mask with a first gap therebetween, the first reference light being illuminated to the recording layer at a first incident angle; and illuminating a second recording light and a second reference light to the recording layer simultaneously, the second recording light being illuminated through the original reticle placed opposite to the holographic mask with a second gap therebetween, the second gap being different from the first gap, the second reference light being illuminated to the recording layer at a second incident angle.