首页> 外国专利> 'ONE-PATCH' TECHNIQUE FOR CORRECTING COMPLETE FORM IN ATRIOVENTRICULAR SEPTAL DEFECT

'ONE-PATCH' TECHNIQUE FOR CORRECTING COMPLETE FORM IN ATRIOVENTRICULAR SEPTAL DEFECT

机译:纠正房室间隔缺损的“单批”技术

摘要

"One-patch" technique for correcting the complete form in atrioventricular septal defect provides for generating the competent left atrioventricular valve in the course of the radical correction of the complete form in atrioventricular septal defect in the case of the acute dysplasia of the left atrioventricular valve. The anterior cusp of the left atrioventricular valve is generated by the duplicature of the pericardial patch at the level of the atrioventricular ring providing for the extra area of the left atrioventricular valve in the case of its acute dysplasia.
机译:纠正房室间隔缺损完整形式的“单补丁”技术可在左房室瓣膜急性增生的情况下彻底纠正房室间隔缺损的完整过程中生成有效的左房室瓣膜。左房室瓣的前尖由房室环水平处的心包膜复制引起,在急性不典型增生的情况下为左房室瓣提供了额外的区域。

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