首页> 外国专利> Device for Coating Specimen for Analyzing by Transmission Electron Microscope and Method for Coating it using the same

Device for Coating Specimen for Analyzing by Transmission Electron Microscope and Method for Coating it using the same

机译:透射电子显微镜分析用镀膜样本的装置及其镀膜方法

摘要

coating unit of specimens for TEM analysis according to the present invention, the vacuum chamber; Specimens for TEM analysis and disposed in a vacuum chamber; Is placed on top of the sample containing the target metal for coating the sample surface, the metal particles are separated from the metal target by the sputtering (sputtering) method is characterized in that the deposit on the sample surface by gravity. ; and coating method of the specimen for TEM analysis according to the present invention, by using a coating apparatus of the specimen for TEM analysis as above, for cutting the sample containing the analysis point to be observed in a predetermined size separately from the wafer stage and; A separate specimen placed in a vacuum chamber, comprising the steps of; A metal target to be coated for the analysis of the sample point and disposing in the vacuum chamber; By a sputtering method by the plasma and the step of removing the metal particles from the metal target; The separated metal particles are characterized in that it comprises a step that is deposited on the surface of the specimen including the analysis point by gravity. And the metal to be coated on the specimen, and platinum (Pt), the thickness of the coating metal on the surface of the specimen is preferably such that the 3 2 to.
机译:根据本发明的用于TEM分析的样品的涂覆单元,真空室;用于TEM分析的样品,并放置在真空室内;被放置在含有用于覆盖样品表面的靶金属的样品的顶部上,通过溅射(溅射)方法将金属颗粒与金属靶分离,其特征在于通过重力沉积在样品表面上。 ;根据本发明的用于TEM分析的样品的涂覆方法和涂覆方法,通过使用如上所述的用于TEM分析的样品的涂覆设备,以预定尺寸将包含待观察的分析点的样品与晶片台分开切割,并且;放置在真空室中的独立样本,包括以下步骤:待镀金属靶,用于分析样品点并放置在真空室中;通过等离子体的溅射方法和从金属靶去除金属颗粒的步骤;分离的金属颗粒的特征在于,其包括通过重力沉积在包括分析点的样品表面上的步骤。并且,待涂覆在试样上的金属和铂(Pt),在试样表面上的涂覆金属的厚度优选为3 2至。

著录项

  • 公开/公告号KR100655581B1

    专利类型

  • 公开/公告日2006-12-08

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20040115803

  • 发明设计人 이원학;

    申请日2004-12-29

  • 分类号G01N1/28;

  • 国家 KR

  • 入库时间 2022-08-21 20:39:59

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