DEVICE OF BATCH-TYPE ATOMIC LAYER DEPOSITION AND THE METHOD OF DEPOSITIONING ATOMIC LAYER USING THE SAME

摘要

in a batch-type atomic layer deposition apparatus , and a semiconductor device using the same of the present invention, an atomic layer deposition method , and the reaction chamber; And a plate mounted within the reaction chamber so that a plurality of wafers can be arranged on the upper surface ; And the first rotary part rotatable with the support in the lower plate; And the second rotating part is movable up and down and can rotate the wafer on the plate in the direction of the lower plate ; Is placed on top within the reaction chamber , and a gas supply unit for supplying a source gas and the purge gas on the plate ; And a discharge port for discharging the gas and the by-product supplied to the plate .