METHOD OF FABRICATING SUBSTRATE WHERE PATTERNS ARE FORMED AND SUBSTRATE FABRICATED BY THE METHOD

摘要

A substrate with a pattern and a manufacturing method thereof are provided to improve the uniformity of the pattern by forming the pattern through deposition of the same amorphous as the substrate. An amorphous film is deposited on a single crystal substrate(20), the amorphous film being made of the same kind as the substrate. The amorphous film is patterned to form an amorphous film pattern. The amorphous film is recrystallized through heat treatment to form a single crystal pattern(22b). The substrate is made of sapphire, and the recrystallizing process is performed at a temperature of 900 to 1300 degrees under an atmosphere of oxygen, nitrogen or its mixture.