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WAFER EDGE EXPOSURE APPARATUS AND WAFER EDGE EXPOSING METHOD USING THE SAME
WAFER EDGE EXPOSURE APPARATUS AND WAFER EDGE EXPOSING METHOD USING THE SAME
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机译:晶圆边缘曝光装置和使用该晶圆边缘曝光方法的晶圆边缘曝光方法
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摘要
An apparatus and method for exposing an edge of a wafer is provided to prevent detection of a notch from being bad by installing a wafer loading/wafer center compensating unit. An apparatus includes a wafer loading/wafer center compensating unit(50) loading a wafer and compensating a center of the wafer, a wafer center checking/notch detecting unit(80) checking the center of the wafer by computing a circumference of the wafer loaded on the wafer loading/wafer center compensating unit and detecting a notch of the wafer, and a wafer edge exposing unit(90) exposing an edge of the wafer. The wafer center checking/notch detecting unit has a light emitting portion and a light receiving portion.
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