PURPOSE: A method for writing image by using an electron beam multi-exposure is provided to be capable of increasing accuracy by doubly applying original data and shifted data from original data when conversing designed data into electron beam data. CONSTITUTION: An original data frame having a plurality of original data chips and an original data dummy pattern, are inserted, wherein the original data dummy pattern has an undefined size when carrying out a process at the edge portion of TP pattern data. Original data are completed by inserting dummy space at a predetermined position spaced apart from data beginning portion of a main chip. A plurality of shift data chip, a shift data frame, a shift data dummy pattern are inserted by shifting as much as a predetermined size larger than that of the original data. At least one pair of shift data are completed by inserting the dummy space at a predetermined position spaced apart from the data beginning portion of the main chip. At least two writing processes are carried out while shifting the pattern by transforming the original data and the shift data into electron beam.
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