DEVICE AND METHOD FOR IMPROVING LINE WIDTH CONTROL IN A LITHOGRAPHY DEVICE USING AN ILLUMINATION SYSTEM HAVING PRE-NUMERICAL APERTURE CONTROL

摘要

It provides a system and method for improving line width control in a lithography device. Electromagnetic energy is emitted from the light source passes through the illumination optical system. The illumination system comprises a coherence adjuster having a first portion and a second optical element. The first optical element is used to change the partial coherence of incident electromagnetic energy in a predetermined manner to compensate for horizontal and vertical line biases of the lithography device. The second optical element is used to change the angular distribution of electromagnetic energy incident upon the first optical element. These two optical elements are used, such as to vary the partial coherence of electromagnetic energy emitted by the illumination source as a function of illumination field position, and improve line width control. By adjusting the second optical element can correct the time-dependent line width variations. ; A lithography system, the projection optical system, partial coherence, a line width control