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Manufacturing method of a crack-resistant semiconductor device and manufacturing apparatus therefor

机译:抗裂半导体器件的制造方法及其制造设备

摘要

A crack-resistant fabrication method and fabrication apparatus for a semiconductor package prevents interface isolation and cracks by coating a semiconductor chip disposed in a semiconductor package, a paddle of a lead frame, bonding wires and a bond paste using a polyimide type coating material. The coating material forms a coating film to act as a buffering member. The fabrication method can include the steps of attaching a semiconductor chip on a paddle, electrically coupling the semiconductor chip and leads, forming a coating film on the surfaces of the semiconductor chip and the leads, and molding the semiconductor chip, the leads, and the coating film.
机译:用于半导体封装的抗裂纹的制造方法和制造设备通过使用聚酰亚胺类涂层材料涂覆布置在半导体封装中的半导体芯片,引线框架的桨,键合线和键合膏来防止界面隔离和裂纹。涂料形成涂膜以充当缓冲构件。所述制造方法可以包括以下步骤:将半导体芯片附接到桨上;将半导体芯片和引线电耦合;在半导体芯片和引线的表面上形成涂膜;以及模制半导体芯片,引线和引线。涂膜。

著录项

  • 公开/公告号DE19723202B4

    专利类型

  • 公开/公告日2007-09-06

    原文格式PDF

  • 申请/专利权人 LG SEMICON CO. LTD.;

    申请/专利号DE1997123202

  • 发明设计人

    申请日1997-06-03

  • 分类号H01L23/31;H01L21/324;H01L21/60;

  • 国家 DE

  • 入库时间 2022-08-21 20:30:13

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