METHOD OF CLEANING SEMICONDUCTOR DEVICE MANUFACTURING COMPONENT, AND CLEANING SOLUTION COMPOSITION

摘要

PROBLEM TO BE SOLVED: To remove deposits on a component forming a semiconductor manufacturing apparatus without damaging quartz, ceramics and sapphire base material as base materials of the component.;SOLUTION: The semiconductor manufacturing apparatus component is cleaned, without damaging the base materials of the components, by using a cleaning composition containing at least one kind selected from among sodium fluoride, potassium fluoride, lithium fluoride and ammonium fluoride, and citric acid.;COPYRIGHT: (C)2008,JPO&INPIT