Polymer or resist pattern, metal thin film pattern and the metal pattern which utilize this, polymer mold and these formation methods

摘要

This invention, with traveling direction of incident light and the method of adjusting permeability, various inclinations and polymer or resist pattern and utilize this metal thin film pattern and the metal pattern which possess form, regards polymer mold and these formation methods at the time of lithography process. As for formation method of the polymer or resist pattern which relates to this invention, (a) applying the photosensitive polymer or the resist on the aforementioned baseplate in the method on the baseplate of forming polymer or resist pattern in specified form, the step which forms the polymer or resist membrane and, (b) being categorized photo mask to the aforementioned polymer or on the resist membrane, the step which decides the exposure part and, (c) the step which is categorized the optical adjustment membrane to sutra road surface of the light which is exposed and, (d) adjusting the aforementioned optical adjustment membrane, advance of the light which is irradiated to the aforementioned polymer or the resist membraneIt features that it includes the step which adjusts direction and permeability and. According to the formation method of the polymer or resist pattern which relates to this invention, various inclinations and the polymer of 3 dimensional structure of form or resist pattern, metal thin film pattern and metal pattern structure, polymer mold can be formed simply.