首页> 外国专利> AMMONIA PRODUCT FOR MANUFACTURING GaN-BASED COMPOUND SEMICONDUCTOR, METHOD OF MANUFACTURING GaN-BASED COMPOUND SEMICONDUCTOR, AND METHOD OF MANUFACTURING AMMONIA FOR MANUFACTURING GaN-BASED COMPOUND SEMICONDUCTOR

AMMONIA PRODUCT FOR MANUFACTURING GaN-BASED COMPOUND SEMICONDUCTOR, METHOD OF MANUFACTURING GaN-BASED COMPOUND SEMICONDUCTOR, AND METHOD OF MANUFACTURING AMMONIA FOR MANUFACTURING GaN-BASED COMPOUND SEMICONDUCTOR

机译:用于制造基于GaN的复合半导体的氨产品,用于制造基于GaN的复合半导体的方法以及用于制造基于GaN的复合半导体的氨的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing GaN-based compound semiconductors capable of surely manufacturing GaN-based compound semiconductors of excellent light emitting performance, and to provide an ammonia product for manufacturing GaN-based compound semiconductors and a method for manufacturing ammonia for manufacturing GaN-based compound semiconductors.;SOLUTION: The ammonia product for manufacturing GaN-based compound semiconductors is provided with a filling container 18 and ammonia filled in the filling container 18 in such a way that at least a part thereof is in a liquid state, wherein the water concentration in the liquid-phase ammonia is 0.5 vol ppm or lower, and the material of the filling container 18 is manganese steel or an aluminum alloy.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种能够可靠地制造具有优异发光性能的GaN基化合物半导体的制造方法,以及提供一种用于制造GaN基化合物半导体的氨产品和一种用于制造氨的方法。解决方案:用于制造GaN基化合物半导体的氨产品配备有填充容器18,氨以至少一部分为液态的方式填充在填充容器18中状态;其中液相氨中的水浓度为0.5 vol ppm或更低,填充容器18的材料为锰钢或铝合金。版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2007335899A

    专利类型

  • 公开/公告日2007-12-27

    原文格式PDF

  • 申请/专利权人 SHOWA DENKO KK;

    申请/专利号JP20070227905

  • 申请日2007-09-03

  • 分类号H01L21/205;C01C1/02;C23C16/34;

  • 国家 JP

  • 入库时间 2022-08-21 20:20:32

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