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Method and system for improving the gate dielectric stack having a high dielectric constant layer using a plasma treatment
Method and system for improving the gate dielectric stack having a high dielectric constant layer using a plasma treatment
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机译:使用等离子体处理来改进具有高介电常数层的栅极电介质堆叠的方法和系统
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摘要
A method and system for modifying a gate dielectric stack by exposure to a plasma. The method includes providing the gate dielectric stack having a high-k layer formed on a substrate, generating a plasma from a process gas containing an inert gas and one of an oxygen-containing gas or a nitrogen-containing gas, where the process gas pressure is selected to control the amount of neutral radicals relative to the amount of ionic radicals in the plasma, and modifying the gate dielectric stack by exposing the stack to the plasma.
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