首页> 外国专利> INSPECTION METHOD, INSPECTION SYSTEM, INSPECTION PROGRAM, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

INSPECTION METHOD, INSPECTION SYSTEM, INSPECTION PROGRAM, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

机译:检查方法,检查系统,检查程序以及制造电子设备的方法

摘要

PROBLEM TO BE SOLVED: To provide an inspection method wherein defect causes in an electronic device are easily checked and identified by non-destruction, and to provide a method of manufacturing the electronic device that employs the same.;SOLUTION: The inspection method includes the steps of (S102) recording QC data accompanying each process of manufacturing the electronic device in a data storage device, (S103) standardizing the QC data of each process to be stored in a common database, (S104) preparing a distribution map showing the QC data of each process from the standardized data, (S106) selecting singularities from the distribution map to generate a singularity map, (S110) comparing the singularity map with a defect cause map related to a product, and (S111) identifying defects from a process, wherein the defect is caused, based on the comparison.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种检查方法,其中可以容易地通过非破坏性检查和识别电子设备中的缺陷原因,并提供一种使用该方法的电子设备的制造方法。步骤(S102)将伴随电子设备制造的每个过程的QC数据记录在数据存储设备中;(S103)标准化每个过程的QC数据以存储在公共数据库中;(S104)准备显示该QC的分布图从标准化数据中获取每个过程的数据,(S106)从分布图选择奇点以生成奇点图,(S110)将奇点图与与产品相关的缺陷原因图进行比较,以及(S111)从过程中识别缺陷;根据比较结果,其中造成了缺陷。;版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2008109095A

    专利类型

  • 公开/公告日2008-05-08

    原文格式PDF

  • 申请/专利权人 TOSHIBA CORP;

    申请/专利号JP20070227991

  • 发明设计人 ONOE SEIJI;TERAMOTO RYUICHI;

    申请日2007-09-03

  • 分类号H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 20:20:00

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