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Production methodological null baseplate of baseplate, electro-optic device, electronic equipment and electro-optic device for

机译:基板的生产方法学空基板,用于其的电光装置,电子设备和电光装置

摘要

PROBLEM TO BE SOLVED: To provide an electro-optic apparatus in which display brightness in the viewing direction can be improved by preventing the reflected light from scattering in unnecessary directions and enhancing the intensity of light in the necessary direction.;SOLUTION: The directional reflective scattering layer in a reflection type or a transflective electro-optic apparatus is provided with a tilted structure necessary to give directivity to the reflected light. A scattering plate having a rough pattern is disposed on the scattering layer, and further a reflecting plate is disposed thereon. The tilted structure is formed by a photolithographic method. As for the photomask, a halftone mask is used, or the mask has elliptic, circular or drop-like patterns as a mask pattern. By using the photomask to optimize the tilted structure, the display brightness in the viewing direction can be improved. The obtained electro-optic apparatus is bright and excellent in visibility.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种电光装置,其中通过防止反射光沿不必要的方向散射并增强必要方向的光强度,可以提高观看方向的显示亮度。反射型或透反射型电光装置中的散射层具有使反射光具有指向性所必需的倾斜结构。具有粗糙图案的散射板布置在散射层上,并且在其上进一步布置反射板。倾斜结构通过光刻法形成。对于光掩模,使用半色调掩模,或者该掩模具有椭圆形,圆形或液滴状的图案作为掩模图案。通过使用光掩模优化倾斜结构,可以提高观看方向上的显示亮度。所得的电光装置明亮且可见性优异。版权所有:(C)2004,日本特许厅

著录项

  • 公开/公告号JP4061992B2

    专利类型

  • 公开/公告日2008-03-19

    原文格式PDF

  • 申请/专利权人 セイコーエプソン株式会社;

    申请/专利号JP20020196462

  • 发明设计人 大竹 俊裕;松尾 睦;

    申请日2002-07-04

  • 分类号G02F1/1335;G09F9/30;G09F9/35;

  • 国家 JP

  • 入库时间 2022-08-21 20:19:05

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