Reference value setting method, pattern determination method, alignment inspection equipment, semiconductor device manufacturing system, a method of manufacturing a semiconductor manufacturing plant and semiconductor device

摘要

PPROBLEM TO BE SOLVED: To provide a reference value setting method and a pattern determining method, wherein even in the case of an underlying pattern having a substantially circular shaped part, it is possible to determine the pertinence of the position of a resist pattern for the underlying pattern accurately. PSOLUTION: A metal wiring image is obtained as corresponding to a metal wiring having the substantially circular shaped part. After a real circle 108 is obtained in a shape approximate to the substantially circular shaped part 101a of the metal wiring image, a shortest straight distance 107 is obtained on an image between an ideal contact pattern image 106 corresponding to a contact pattern in designing of a resist to be formed corresponding to the metal wiring and the real circle 108. By use of this shortest straight distance 107, a reference value is decided for determining the pertinence of the position of a contact pattern corresponding to the metal wiring. PCOPYRIGHT: (C)2006,JPO&NCIPI