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Production method and a thin film multilayer electronic component of a thin-film multilayer electronic component

机译:薄膜多层电子部件的制造方法和薄膜多层电子部件

摘要

PROBLEM TO BE SOLVED: To provide a thin film stacked electronic component like a thin film stacked capacitor wherein planarity is not damaged even if the number of the laminations is increased largely, so that cracks and electrode shorting are not caused and the reliability is improved, and to provide its manufacturing method.;SOLUTION: Firstly, a first conductor thin film 20 is formed on a substrate 6. Secondly, a part of the first conductor thin film 20 is insulated in a thickness direction, and an insulating pattern 44a is formed in the first conductor thin film 20. Thirdly an interlayer insulator film 12 is formed on the first conductor thin film 20 in which the insulating pattern 44a is formed. The respective processes from the first process to the third process are repeated on the interlayer insulator film 12.;COPYRIGHT: (C)2004,JPO
机译:要解决的问题:提供一种薄膜叠层电子元件,例如薄膜叠层电容器,即使叠层数量大大增加,其平面度也不会受到损害,从而不会引起裂纹和电极短路,并提高了可靠性,解决方案:首先,在基板6上形成第一导体薄膜20。其次,第一导体薄膜20的一部分在厚度方向上绝缘,并且形成绝缘图案44a。在第一导体薄膜20中形成绝缘膜。第三,在形成有绝缘图案44a的第一导体薄膜20上形成层间绝缘膜12。在层间绝缘膜12上重复从第一工序到第三工序的各个工序。版权所有:(C)2004,日本特许厅

著录项

  • 公开/公告号JP4147075B2

    专利类型

  • 公开/公告日2008-09-10

    原文格式PDF

  • 申请/专利权人 TDK株式会社;

    申请/专利号JP20020265174

  • 发明设计人 坂下 幸雄;鈴木 利幸;

    申请日2002-09-11

  • 分类号H01G4/30;H01G4/33;H01G13/00;

  • 国家 JP

  • 入库时间 2022-08-21 20:18:24

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