首页> 外国专利> Semiconductor Devices Having Contact Holes Including Protrusions Exposing Contact Pads and Methods of Fabricating the Same

Semiconductor Devices Having Contact Holes Including Protrusions Exposing Contact Pads and Methods of Fabricating the Same

机译:具有包括暴露接触垫的凸起的接触孔的半导体器件及其制造方法

摘要

Semiconductor devices are provided including a semiconductor substrate and a first interlayer insulating layer on the semiconductor substrate. A contact pad is provided in the first interlayer insulating layer and a second insulating layer is provided on the first interlayer insulating layer. A contact hole is provided in the second interlayer insulating layer. The contact hole exposes the contact pad and a lower portion of the contact hole has a protrusion exposing the contact pad. The protrusion is provided on the second interlayer insulating layer. A contact spacer is provided on inside sidewalls of the contact hole and fills the protrusion. A contact plug is provided in the contact hole. Related methods are also provided herein.
机译:提供了包括半导体衬底和在半导体衬底上的第一层间绝缘层的半导体器件。接触垫设置在第一层间绝缘层中,并且第二绝缘层设置在第一层间绝缘层上。在第二层间绝缘层中设置有接触孔。接触孔暴露接触垫,并且接触孔的下部具有暴露接触垫的突起。突起设置在第二层间绝缘层上。接触间隔件设置在接触孔的内侧侧壁上并填充突起。在接触孔中设置有接触塞。本文还提供了相关方法。

著录项

  • 公开/公告号US2008067678A1

    专利类型

  • 公开/公告日2008-03-20

    原文格式PDF

  • 申请/专利权人 BYUNG-YOON KIM;

    申请/专利号US20070850208

  • 发明设计人 BYUNG-YOON KIM;

    申请日2007-09-05

  • 分类号H01L23/52;H01L21/4763;

  • 国家 US

  • 入库时间 2022-08-21 20:15:07

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