首页> 外国专利> HIGH DENSITY CERAMIC AND CERMET SPUTTERING TARGETS BY MICROWAVE SINTERING

HIGH DENSITY CERAMIC AND CERMET SPUTTERING TARGETS BY MICROWAVE SINTERING

机译:微波烧结高密度陶瓷和金属陶瓷的靶材

摘要

A method of manufacturing sputtering targets from powder materials, comprising steps of: providing at least one raw powder material; forming the at least one raw powder material into a green body with density greater than about 40 % of theoretical maximum density; treating the green body with microwaves to form a sintered body with density greater than about 97% of theoretical maximum density; and forming a sputtering target from the sintered body. The methodology is especially useful in the fabrication of targets comprising dielectric and cermet materials.
机译:一种由粉末材料制造溅射靶的方法,包括以下步骤:提供至少一种原始粉末材料;和将所述至少一种原料粉末形成生坯,所述生坯的密度大于理论最大密度的约40%;用微波处理生坯以形成密度大于理论最大密度约97%的烧结体;从烧结体形成溅射靶。该方法在制造包括介电和金属陶瓷材料的靶时特别有用。

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