首页>
外国专利>
HIGH DENSITY CERAMIC AND CERMET SPUTTERING TARGETS BY MICROWAVE SINTERING
HIGH DENSITY CERAMIC AND CERMET SPUTTERING TARGETS BY MICROWAVE SINTERING
展开▼
机译:微波烧结高密度陶瓷和金属陶瓷的靶材
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method of manufacturing sputtering targets from powder materials, comprising steps of: providing at least one raw powder material; forming the at least one raw powder material into a green body with density greater than about 40 % of theoretical maximum density; treating the green body with microwaves to form a sintered body with density greater than about 97% of theoretical maximum density; and forming a sputtering target from the sintered body. The methodology is especially useful in the fabrication of targets comprising dielectric and cermet materials.
展开▼