HIGH DENSITY CERAMIC AND CERMET SPUTTERING TARGETS BY MICROWAVE SINTERING

摘要

HIGH DENSITY CERAMIC AND CERMET SPUTTERING TARGETS BY MICROWAVESINTERING Abstract of the DisclosureA method of manufacturing sputtering targets from powder materials, comprising steps of. providing at least one raw powder material; forming the at least one raw powder material into a green body with density greater than about 40 % of theoretical maximum density;treating the green body with microwaves to form a sintered body with density greater than about 97 % of theoretical maximum density; and forming a sputtering target from the sintered body. The methodology is especially useful in the fabrication of targets comprising dielectric and cermet materials:Figure 1