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Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode
Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode
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机译：氧化物烧结体和溅射靶，以及透明导电氧化物膜作为电极的制造方法
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摘要
An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 kΩm or less.
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