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Diamond-like carbon films with low dielectric constant and high mechanical strength

机译:介电常数低,机械强度高的类金刚石碳膜

摘要

The present invention discloses a method including: providing a substrate; and sequentially stacking layers of two or more diamond-like carbon (DLC) films over the substrate to form a composite dielectric film, the composite dielectric film having a k value of about 1.5 or lower, the composite dielectric film having a Young's modulus of elasticity of about 25 GigaPascals or higher.;The present invention further discloses a structure including: a substrate; a porous diamond-like carbon (DLC) film located over the substrate; an opening located in the porous DLC film; and a conductor located in the opening.
机译:本发明公开了一种方法,包括:提供基板;然后在基板上依次堆叠两层或更多层类金刚石碳(DLC)膜层,以形成复合介电膜,该复合介电膜的ak值约为1.5或更小,该复合介电膜的杨氏弹性模量为本发明还公开了一种结构,该结构包括:基板;和约25 GPa。位于基底上方的多孔类金刚石碳(DLC)膜;位于多孔DLC膜中的开口;和位于开口处的导体。

著录项

  • 公开/公告号US7384693B2

    专利类型

  • 公开/公告日2008-06-10

    原文格式PDF

  • 申请/专利权人 KRAMADHATI V. RAVI;

    申请/专利号US20040835479

  • 发明设计人 KRAMADHATI V. RAVI;

    申请日2004-04-28

  • 分类号B32B3/26;

  • 国家 US

  • 入库时间 2022-08-21 20:09:49

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