首页> 外国专利> Ag ALLOY REFLECTIVE FILM FOR REFLECTOR, REFLECTOR, AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF Ag ALLOY REFLECTIVE FILM FOR REFLECTOR

Ag ALLOY REFLECTIVE FILM FOR REFLECTOR, REFLECTOR, AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF Ag ALLOY REFLECTIVE FILM FOR REFLECTOR

机译:用于反射器的Ag合金反射膜,反射器和用于形成反射器的Ag合金反射膜的Ag合金溅射靶

摘要

Disclosed are: an Ag alloy reflective film for use in the formation of a reflector which has a high reflectivity and hardly causes the coagulation of Ag by humidity or heat; a reflector; and an Ag alloy sputtering target for use in the formation of an Ag alloy reflective film for a reflector. (1) Disclosed is an Ag alloy reflective film for a reflector, which comprises Ag as the main ingredient and one or more members selected from Ti, V, Cr, Mn, Mg and W in a total amount of more than 3 atm% and not more than 7 atm%. (2) The Ag alloy reflective film may contain one or more members selected from Au, Pt, Pd and Cu in a total amount of 0.3 to 2 atm%. (3) The Ag alloy reflective film may have a reflectivity as measured with light having a wavelength of 650 nm of 85% or greater. (4) The Ag alloy reflective film may be formed by a sputtering process. (5) Also disclosed is a reflector having the Ag alloy reflective film. (6) Further disclosed is a target for use in the formation of an Ag alloy reflective film.
机译:公开:一种用于形成反射器的Ag合金反射膜,该反射器具有高反射率并且几乎不会由于湿气或热而引起Ag的凝结。反射器用于形成反射器的Ag合金反射膜的Ag合金溅射靶。 (1)公开了一种用于反射器的Ag合金反射膜,其以Ag为主要成分和选自Ti,V,Cr,Mn,Mg和W中的一种或多种的总量大于3atm%,并且不超过7 atm%。 (2)Ag合金反射膜可以以0.3〜2atm%的总量含有选自Au,Pt,Pd和Cu中的一种或多种。 (3)Ag合金反射膜可以具有用波长为650nm的光测量为85%或更大的反射率。 (4)可以通过溅射工艺形成Ag合金反射膜。 (5)还公开了一种具有Ag合金反射膜的反射器。 (6)进一步公开了用于形成Ag合金反射膜的靶。

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