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Ag ALLOY REFLECTIVE FILM FOR REFLECTOR, REFLECTOR, AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF Ag ALLOY REFLECTIVE FILM FOR REFLECTOR
Ag ALLOY REFLECTIVE FILM FOR REFLECTOR, REFLECTOR, AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF Ag ALLOY REFLECTIVE FILM FOR REFLECTOR
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机译:用于反射器的Ag合金反射膜,反射器和用于形成反射器的Ag合金反射膜的Ag合金溅射靶
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摘要
Disclosed are: an Ag alloy reflective film for use in the formation of a reflector which has a high reflectivity and hardly causes the coagulation of Ag by humidity or heat; a reflector; and an Ag alloy sputtering target for use in the formation of an Ag alloy reflective film for a reflector. (1) Disclosed is an Ag alloy reflective film for a reflector, which comprises Ag as the main ingredient and one or more members selected from Ti, V, Cr, Mn, Mg and W in a total amount of more than 3 atm% and not more than 7 atm%. (2) The Ag alloy reflective film may contain one or more members selected from Au, Pt, Pd and Cu in a total amount of 0.3 to 2 atm%. (3) The Ag alloy reflective film may have a reflectivity as measured with light having a wavelength of 650 nm of 85% or greater. (4) The Ag alloy reflective film may be formed by a sputtering process. (5) Also disclosed is a reflector having the Ag alloy reflective film. (6) Further disclosed is a target for use in the formation of an Ag alloy reflective film.
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