首页> 外国专利> Ag ALLOY REFLECTION FILM FOR REFLECTOR, REFLECTOR AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF Ag ALLOY REFLECTION FILM FOR REFLECTOR

Ag ALLOY REFLECTION FILM FOR REFLECTOR, REFLECTOR AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF Ag ALLOY REFLECTION FILM FOR REFLECTOR

机译:用于反射器的Ag合金反射膜,用于形成反射器的Ag合金反射膜的反射器和Ag合金溅射靶

摘要

PROBLEM TO BE SOLVED: To provide an Ag alloy reflective film for a reflector having high reflectivity and hardly causing coagulation of Ag by humidity or heat.;SOLUTION: There are provided: (1) the Ag alloy reflective film for a reflector containing Ag as the main ingredient and one or more members selected from Ti, V, Cr, Mn, Mg and W in a total amount of 3 to 7 atomic%; (2) the Ag alloy reflective film may containing one or more members selected from Au, Pt, Pd, Cu in a total amount of 0.3 to 2 atomic%; (3) the Ag alloy reflective film of which a reflectivity as measured with light at a wavelength of 650 nm is ≥85%; (4) the Ag alloy reflective film which is formed by a sputtering process; (5) a reflector having the Ag alloy reflective film; (6) a target or the like for use in the formation of the Ag alloy reflective film.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种用于反射器的Ag合金反射膜,该反射器具有高反射率并且几乎不因湿气或热引起Ag的凝结。解决方案:提供:(1)一种用于Ag的反射器的Ag合金反射膜,其包含Ag作为主要成分和一种或多种选自Ti,V,Cr,Mn,Mg和W的元素,其总量> 3至7原子%; (2)上述Ag合金反射膜可以含有选自Au,Pt,Pd,Cu中的一种或多种,​​其总量为0.3〜2原子%。 (3)一种Ag合金反射膜,用波长650nm的光测得的反射率为85%以上。 (4)通过溅射法形成的Ag合金反射膜。 (5)具有Ag合金反射膜的反射器。 (6)用于形成Ag合金反射膜的靶材等;版权所有:(C)2008,日本特许厅

著录项

  • 公开/公告号JP2008046149A

    专利类型

  • 公开/公告日2008-02-28

    原文格式PDF

  • 申请/专利权人 KOBE STEEL LTD;

    申请/专利号JP20060218593

  • 发明设计人 SATO TOSHIKI;KAWANAKA TAKEO;SUZUKI JUN;

    申请日2006-08-10

  • 分类号G02B5/08;C23C14/34;C23C14/14;

  • 国家 JP

  • 入库时间 2022-08-21 20:21:26

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