CLUSTER TYPE BLANK MASK AND ITS MANUFACTURING PROCESS AND MANUFACTURNG METHOD OF PHOTOMASK THEREBY

摘要

A cluster type blank mask, a method for manufacturing blank, and photo masks are provided to reduce scum in photo mask manufacturing by controlling ammonia on photoresist. An anti-reflective coating layer(6) and/or a light shielding layer(4) are stacked on a transparent substrate(2) using reactive sputtering and vacuum depositing schemes so as to improve the particles of a metal layer. Resists are coated on the anti-reflective coating layer and/or light shielding layer. The anti-reflective coating layer and light shielding layer are formed based on a metal in a vacuum chamber used inert gas and reactive gas using reactive sputtering and vacuum depositing schemes. The metal is at least one selected from a group consisting of Co, Ta, W, Mo, Cr, V, Pd, Ti, Nb, Zn, Hf, Ge, Al, Pt, Mn, Fe, Si, Ni, Cd, Zr, Mg, Li, Se, Cu, Y, and S. The inert gas is at least one selected from a group consisting of Ar, He, Ne, and Xe. The reactive gas is at least one selected from a group consisting of O2, CO, CO2, N2O, NO, NO2, NH3, CH4, and F.