Method of manufacturing a photomask blank, method of manufacturing a reflective mask blank, method of manufacturing photomask, and method of manufacturing a reflective mask

摘要

PPROBLEM TO BE SOLVED: To provide a substrate for a photomask blank and a photomask blank in which film thickness uniformity in the plane of a resist film can be improved and high mask pattern accuracy is obtained, and to provide a photomask having a fine pattern formed with high pattern accuracy by using the photomask blank. PSOLUTION: The substrate 1 for a photomask blank has a thin film for forming a transfer pattern on a light transmitting substrate, wherein the substrate 1 has main surfaces 11a, 11b and an end face 12 formed on the rim of the main surfaces, and the end face 12 includes a side face 12c of the substrate and chamfered faces 12a, 12b interposed between the side face and the main surfaces. At least the chamfered face continued from the main surface where the thin film is to be formed, among the chamfered faces, has a flatness of ≤50 μm. The photomask blank has a thin film for forming a transfer pattern, the film formed on the main surface of the substrate 1. The photomask has a transfer pattern by patterning the thin film of the photomask blank. PCOPYRIGHT: (C)2009,JPO&INPIT