首页> 外国专利> Formation method of solder bumps using thin film heater fabricated on IC chip or IC chip wafer and the facility to make the same

Formation method of solder bumps using thin film heater fabricated on IC chip or IC chip wafer and the facility to make the same

机译:使用在IC芯片或IC芯片晶片上制造的薄膜加热器的焊料凸点的形成方法及其制造设备

摘要

The present invention relates to a method and apparatus for forming a solder bump on a semiconductor chip wafer before dicing the semiconductor chip or the semiconductor chip, and more particularly, to a semiconductor chip wafer before dicing the semiconductor chip or the semiconductor chip. The present invention relates to a method and apparatus for forming a solder bump by reflowing a solder of a semiconductor chip by applying a current to a thin film heater. In addition, the present invention uses a thin film heater formed on a semiconductor chip wafer before dicing the semiconductor chip or semiconductor chip in an inert gas atmosphere such as argon or nitrogen, a flux-free soldering gas such as hydrogen, or vacuum without using flux. The present invention relates to a method and apparatus for forming solder bumps in a flux-free process by reflowing solder in a semiconductor chip.;According to the present invention, by applying a current to a thin film heater formed on a semiconductor chip or a semiconductor chip wafer, the heat generated from the thin film heater is conducted to the solder of the semiconductor chip through a silicon (Si) semiconductor having excellent thermal conductivity and these solders are reflowed. Solder bumps are formed.;According to the present invention, by forming a solder bump using a thin film heater formed on a semiconductor chip or a semiconductor chip wafer, there is an advantage of simplifying the solder bump forming method and apparatus and improving thermal efficiency as compared with the conventional method. In addition, environmentally friendly advantages are achieved by forming solder bumps using a thin film heater formed on a semiconductor chip or a semiconductor chip wafer in an inert gas atmosphere such as argon or nitrogen, a flux-free soldering gas such as hydrogen, or a vacuum without using flux. There is an economical advantage to omit the flux cleaning process.;Thin Film Heater, Solder Bump, Semiconductor, Reflow, Flip Chip
机译:本发明涉及在对半导体芯片或半导体芯片进行切割之前在半导体芯片晶片上形成焊料凸块的方法和设备,更具体地,涉及在对半导体芯片或半导体芯片进行切割之前在半导体芯片晶片上形成焊料凸块。本发明涉及一种通过向薄膜加热器施加电流而使半导体芯片的焊料回流来形成焊料凸块的方法和装置。另外,本发明使用形成在半导体芯片晶片上的薄膜加热器,然后在不使用氩气或氮气的惰性气体气氛中切割半导体芯片或半导体芯片,或者在不使用氢气的情况下将无焊剂的焊接气体如氢气切割成真空。通量。本发明涉及一种通过使半导体芯片中的焊料回流而在无焊剂工艺中形成焊料凸块的方法和设备。根据本发明,通过向形成在半导体芯片或半导体芯片上的薄膜加热器施加电流来形成焊料凸块。在半导体芯片晶片中,从薄膜加热器产生的热量通过具有良好导热性的硅(Si)半导体传导至半导体芯片的焊料,并且这些焊料回流。根据本发明,通过使用形成在半导体芯片或半导体芯片晶片上的薄膜加热器形成焊料凸块,具有简化焊料凸块形成方法和装置并提高热效率的优点。与传统方法相比此外,通过在惰性气体气氛(例如氩气或氮气),无助焊剂的焊接气体(例如氢气)或氩气中使用形成在半导体芯片或半导体芯片晶片上的薄膜加热器形成焊料凸点,可以获得环保优势。真空而不使用助焊剂。省略焊剂清洗工艺具有经济优势。;薄膜加热器,焊锡凸块,半导体,回流焊,倒装芯片

著录项

  • 公开/公告号KR100808106B1

    专利类型

  • 公开/公告日2008-02-29

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20060043763

  • 申请日2006-05-16

  • 分类号H01L21/60;

  • 国家 KR

  • 入库时间 2022-08-21 19:52:30

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