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SUSCEPTOR OF USING SEMICONDUCTOR PROCESS EQUIPMENT AND SEMICONDUCTOR PROCESS EQUIPMENT HAVING THEROF

机译:拥有使用半导体制程设备的主管和具有该功能的半导体制程设备

摘要

the present invention is a liquid crystal display device or a semiconductor manufacturing process in the manufacturing process using the CVD chamber or a PECVD chamber is used , etc. a susceptor that is used in a semiconductor process chamber is disclosed for preventing the disconnection of the susceptor to the heater . The invention disclosed semiconductor process equipment susceptor , a showerhead , which supplies a gas , according to the semiconductor process equipment with a susceptor that corresponds to the shower head , the heater for heating the susceptor up and power to the heater lead exposed to the outside to supply ; Heating wire connected to said lead ; System formed to surround the heating wire; Ceramic material filled inside the sheath ; To and including the blocking layer formed on the ends of the system .
机译:本发明是在使用CVD腔室或PECVD腔室的制造工艺中使用的液晶显示装置或半导体制造工艺等。公开了一种在半导体工艺腔室中使用的用于防止基座断开的基座。到加热器。本发明公开了一种半导体处理设备基座,一种喷淋头,其根据半导体处理设备提供与喷淋头相对应的基座,用于加热基座的加热器以及向暴露于外部的加热器引线供电。供应;电热丝连接到所述引线;围绕加热丝形成的系统;护套内填充陶瓷材料;并包括形成在系统末端的阻挡层。

著录项

  • 公开/公告号KR100826432B1

    专利类型

  • 公开/公告日2008-04-29

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20030076747

  • 发明设计人 김홍렬;

    申请日2003-10-31

  • 分类号G02F1/13;

  • 国家 KR

  • 入库时间 2022-08-21 19:52:09

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