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A POWER MOSFET, A METHOD OF FORMING A POWER MOSFET, AND ANOTHER POWER MOSFET MADE BY THE METHOD

机译:功率MOSFET,形成功率MOSFET的方法以及由该方法制成的另一种功率MOSFET

摘要

A power MOSFET is provided that includes a substrate of a first conductivity type. An epitaxial layer also of the first conductivity type is deposited on the substrate. First and second body regions are located in the epitaxial layer and define a drift region between them. The body regions have a second conductivity type. First and second source regions of the first conductivity type are respectively located in the first and second body regions. A plurality of trenches are located below the body regions in the drift region of the epitaxial layer. The trenches, which extend toward the substrate from the first and second body regions, are filled with a material that includes a dopant of the second conductivity type. The dopant is diffused from the trenches into portions of the epitaxial layer adjacent the trenches.
机译:提供了一种功率MOSFET,其包括第一导电类型的衬底。同样具有第一导电类型的外延层沉积在基板上。第一和第二主体区域位于外延层中,并在它们之间定义了一个漂移区域。主体区域具有第二导电类型。第一导电类型的第一和第二源极区域分别位于第一和第二主体区域中。多个沟槽位于外延层的漂移区域中的主体区域下方。从第一主体区域和第二主体区域向基板延伸的沟槽填充有包括第二导电类型的掺杂剂的材料。掺杂剂从沟槽扩散到邻近沟槽的外延层的部分中。

著录项

  • 公开/公告号KR100829052B1

    专利类型

  • 公开/公告日2008-05-19

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20077005532

  • 发明设计人 블랑차드 리차드 에이.;

    申请日2007-03-08

  • 分类号H01L29/78;

  • 国家 KR

  • 入库时间 2022-08-21 19:52:06

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