PHOTOCURABLE COMPOSITION FOR PHOTO-NANOIMPRINT LITHOGRAPHY AND MANUFACTURING METHOD OF SUBSTRATE WITH PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a photocurable composition for photo-nanoimprint lithography, which excels in curability of the surface and the inside and can form a resist pattern excellent in exfoliation from a mold.;SOLUTION: The photocurable composition for the photo-nanoimprint lithography comprises (a) a polymerizable compound, (b) a photopolymerization initiator and (c) a surface-active photo polymerization initiator, and its viscosity at 25°C is ≥3 mPa s and ≤30 mPa s.;COPYRIGHT: (C)2009,JPO&INPIT