首页> 外国专利> GaN SINGLE CRYSTAL SUBSTRATE, METHOD FOR MANUFACTURING GaN SINGLE CRYSTAL SUBSTRATE, LIGHT-EMITTING ELEMENT MANUFACTURED ON GaN SINGLE CRYSTAL SUBSTRATE AND METHOD FOR MANUFACTURING THE LIGHT-EMITTING ELEMENT

GaN SINGLE CRYSTAL SUBSTRATE, METHOD FOR MANUFACTURING GaN SINGLE CRYSTAL SUBSTRATE, LIGHT-EMITTING ELEMENT MANUFACTURED ON GaN SINGLE CRYSTAL SUBSTRATE AND METHOD FOR MANUFACTURING THE LIGHT-EMITTING ELEMENT

机译:GaN单晶基板,制造GaN单晶基板的方法,在GaN单晶基板上制造的发光元件以及制造发光元件的方法

摘要

PROBLEM TO BE SOLVED: To provide a GaN single crystal substrate which has a wide area and little warp and is self-supportable; and to provide a method for manufacturing the same.;SOLUTION: The GaN single crystal substrate has a diameter of ≥20 mm and a thickness of ≥0.07 mm, and is self-supportable and characterized in that the angle formed by the normal line of a polished substrate surface and the normal line of the crystal plane of a low plane index having highest parallelism with the polished substrate surface is ≤3° in the substrate, at least one surface is polished, and the content of carbon contained in the crystal is a background level of the analysis.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种GaN单晶衬底,该GaN单晶衬底具有大的面积,小的翘曲并且是可自支撑的。 SOLUTION:GaN单晶衬底的直径为20毫米,厚度为0.07毫米,可自我支撑,其特征在于法线形成的角度抛光的衬底表面的直线和与抛光的衬底表面具有最高平行度的低平面折射率的晶面的法线为≤ 3。在基板上至少抛光了一个表面,晶体中的碳含量是分析的背景水平。版权所有:(C)2009,JPO&INPIT

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号