CATALYST CVD APPARATUS, METHOD FOR TREATING CATALYST BODY USED FOR CATALYST CVD APPARATUS, AND METHOD FOR FORMING FILM USING CATALYST CVD APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method capable of stably forming an amorphous silicon deposited film in catalyst CVD process, and to provide a method for treating a catalyst body used for catalyst CVD process.;SOLUTION: The catalyst CVD apparatus for producing non-single crystal silicon films containing at least hydrogen and/or halogen comprises a reaction chamber for receiving a substrate, a gas supply means for supplying a source gas containing silicon atoms into the reaction chamber, and a catalyst body arranged so as to be brought into contact with the source gas supplied from the gas supply means. The catalyst CVD apparatus is characterized in that a carbon film is formed on the surface of the catalyst body near a catalyst body-attaching part of the catalyst body.;COPYRIGHT: (C)2009,JPO&INPIT