首页> 外国专利> METHOD FOR ELECTRONIC BEAM DRAWING, MICROSCOPIC PATTERN DRAWING SYSTEM, METHOD FOR MANUFACTURING CONCAVE-CONVEX PATTERN SUPPORTER, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM

METHOD FOR ELECTRONIC BEAM DRAWING, MICROSCOPIC PATTERN DRAWING SYSTEM, METHOD FOR MANUFACTURING CONCAVE-CONVEX PATTERN SUPPORTER, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM

机译:电子束的绘制方法,显微图案绘制系统,凹凸图案支撑件的制造方法以及磁碟介质的制造方法

摘要

PPROBLEM TO BE SOLVED: To draw a long element corresponding to two-bit signal length of a microscopic pattern formed on a magnetic disk medium without making a gap in the central part with high accuracy and at high speed. PSOLUTION: Drawing the long element 14 is done by scanning in such a way that the central part of the two-bit signal length 2kT is taken as a central position s and a range in which a drawing length gets shortened by a predetermined ratio is filled and by leaving a non-drawing part with a predetermined width in both sides for the two-bit signal length 2T final on the magnetic recording medium when drawing by rotating a substrate 10 with a resist 11 applied in one direction, and executing X-Y deflection while reciprocating the electronic beam EB at high speed in the X direction perpendicular to the radius direction Y of the substrate 10. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:绘制与形成在磁盘介质上的微观图案的两位信号长度相对应的长元素,而不会在中心部分以高精度和高速产生间隙。

解决方案:以如下方式进行扫描来绘制长形元件14:以两位信号长度2kT的中心部分为中心位置s,并且将绘制长度缩短预定范围的范围当通过在一个方向上施加有抗蚀剂11的基板10旋转并进行绘制时,在磁记录介质上最终填充两位数信号长​​度2T的非绘制部分被填充并通过在两侧留下预定宽度的非绘制部分来执行。电子束EB在垂直于基板10的半径方向Y的X方向上高速往复运动时的XY偏转。

COPYRIGHT:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009205705A

    专利类型

  • 公开/公告日2009-09-10

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORP;

    申请/专利号JP20080043758

  • 发明设计人 USA TOSHIHIRO;KOMATSU KAZUNORI;

    申请日2008-02-26

  • 分类号G11B5/855;G11B5/86;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 19:44:10

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