ELECTRONIC BEAM DRAWING METHOD, ELECTRONIC BEAM DRAWING SYSTEM, MANUFACTURING METHOD FOR UNEVEN PATTERN CARRIER, AND MANUFACTURING METHOD FOR MAGNETIC DISK MEDIUM

摘要

PROBLEM TO BE SOLVED: To obtain a more sharp developed pattern after electronic beam drawing for one pair of elements adjacent in a diagonal direction in a required drawn pattern.;SOLUTION: For at least one element A₁ selected from pair of elements A₁ and A₂, one end position on the other element A₂ side in deflection scan D₁ in a radial direction Y for the one element A₁ is set in a position apart from the other element A₂ with respect to a radial end position y in the designed arrangement of the one element A₁. Drawing is carried out so that a deflection scanning length L₁ in the radial direction Y is shorter than the designed length L of the one element A₁ in the radial direction Y.;COPYRIGHT: (C)2012,JPO&INPIT