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Electron beam drawing method, fine pattern drawing system, method of manufacturing concave / convex pattern carrier, and method of manufacturing magnetic disk medium
Electron beam drawing method, fine pattern drawing system, method of manufacturing concave / convex pattern carrier, and method of manufacturing magnetic disk medium
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机译:电子束描绘方法,精细图案描绘系统,凹凸图案载体的制造方法以及磁盘介质的制造方法
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摘要
When performing writing on a substrate applied with a resist by rapidly vibrating electron beam in a direction orthogonal to a radial direction of the substrate and X-Y deflecting the electron beam while rotating the substrate in one direction, a long element is written by scanning the electron beam with the middle position of a 2-bit signal length as the center position of the electron beam so as to completely fill the area of the writing length reduced by a predetermined ratio and an unwritten portion of predetermined width remaining on each side of the long element with respect to a final 2-bit signal length on a magnetic disk medium.
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