首页> 外国专利> FILM-DEPOSITING METHOD OF ANTIREFLECTION LAYER PROVIDED WITH ANTIFOULING LAYER AND FILM-DEPOSITING DEVICE THEREFOR

FILM-DEPOSITING METHOD OF ANTIREFLECTION LAYER PROVIDED WITH ANTIFOULING LAYER AND FILM-DEPOSITING DEVICE THEREFOR

机译:设有防渗层的防溅层的成膜方法及其成膜装置

摘要

PROBLEM TO BE SOLVED: To provide a film-depositing method of an antireflection layer which is provided with an antifouling layer excellent in endurance on the antireflection layer of an optical element without damaging visibility, and to provide a device for performing the film-deposition.;SOLUTION: The film-depositing method of antireflection layer is characterized in that the antireflection layer is formed on a substrate and a polytetrafluoroethylene film having a thickness of 10 nm or less is laminated on the antireflection layer as an antifouling layer according to a CVD method.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种抗反射层的膜沉积方法,该方法在光学元件的抗反射层上具有耐久性优异的防污层,而不会损害可见性,并且提供一种用于进行膜沉积的装置。 ;解决方案:抗反射层的沉积方法的特征在于,在基板上形成抗反射层,并根据CVD方法在抗反射层上层压厚度为10nm或更小的聚四氟乙烯膜作为抗污层。 。;版权:(C)2009,日本特许厅和INPIT

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号