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NONVOLATILE MEMORY TRANSISTOR, NONVOLATILE MEMORY DEVICE, AND DATA ERASING METHOD OF NONVOLATILE MEMORY TRANSISTOR

机译:非易失性存储器晶体管,非易失性存储器装置以及非易失性存储器晶体管的数据擦除方法

摘要

PROBLEM TO BE SOLVED: To provide a nonvolatile memory transistor capable of reducing damage that may be inflicted on a drain-side gate oxide film; a nonvolatile memory device; and a data erasing method of a nonvolatile memory transistor.;SOLUTION: In a nonvolatile memory 10, data are erased by applying, to a source 12, a voltage causing avalanche breakdown in a part between α a part (a depletion layer tip Dpp) in the vicinity of a source-side end 15a, of a floating gate electrode 15 in a depletion layer Dp extending from the source 12 to the source-side end 15a of the floating gate electrode 15 below a part 18a of a control gate electrode 18 arranged in parallel with the floating gate electrode 15, and a semiconductor substrate 11. Thereby, the erasure is executed from the source 12 side, whereby damage that may be inflicted on the gate oxide film 14 on the drain 13 side can be reduced as compared with the case where writing and erasure are executed from the drain 13 side.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种非易失性存储晶体管,其能够减少可能在漏极侧栅极氧化膜上造成的损坏;非易失性存储设备;解决方案:在非易失性存储器10中,通过向源极12施加在α之间的部分引起雪崩击穿的电压来擦除数据,从而擦除数据。从源极12向下方的浮置栅极电极15的源极侧端部15a延伸的耗尽层Dp中的浮置栅极电极15的源极侧端部15a附近的一部分(耗尽层尖端Dpp)与浮置栅电极15平行地布置的控制栅电极18的一部分18a和半导体衬底11。由此,从源极12侧执行擦除,从而可能在栅氧化膜14上造成损伤。与从漏极13侧执行写入和擦除的情况相比,可以减少漏极13侧。;版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009064847A

    专利类型

  • 公开/公告日2009-03-26

    原文格式PDF

  • 申请/专利权人 DENSO CORP;

    申请/专利号JP20070229673

  • 发明设计人 YOGO YUKIAKI;TAI AKIRA;KATADA MITSUTAKA;

    申请日2007-09-05

  • 分类号H01L21/8247;H01L29/788;H01L29/792;H01L27/115;G11C16/02;G11C16/04;

  • 国家 JP

  • 入库时间 2022-08-21 19:44:06

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