METHOD OF MANUFACTURING SYNTHETIC QUARTZ GLASS MEMBER FOR ArF EXCIMER LASER LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a synthetic quartz glass member for ArF excimer laser lithography which is used for a lighting system or a projecting system such as lens, prism or beam splitter and has high internal transmittance.;SOLUTION: The method of manufacturing the synthetic quartz glass member for ArF excimer laser lithography is carried out by forming high purity synthetic quartz glass into a synthetic quartz glass member through a homogenizing step, a molding step and a distortion-removing step and irradiating with continuous ultraviolet ray having ≤260 nm wavelength for ≥50 hr to make the internal transmittance to the 193.4 nm wavelength ≥99.8%.;COPYRIGHT: (C)2009,JPO&INPIT