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HIGH HARDNESS Ag ALLOY SPUTTERING TARGET FOR FORMING REFLECTIVE FILM OF OPTICAL RECORDING MEDIUM
HIGH HARDNESS Ag ALLOY SPUTTERING TARGET FOR FORMING REFLECTIVE FILM OF OPTICAL RECORDING MEDIUM
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机译:高硬度Ag合金溅射靶材,用于形成光学记录介质的反射膜
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摘要
PROBLEM TO BE SOLVED: To provide an Ag alloy sputtering target for forming an Ag alloy reflective film of an optical recording medium (a CD-RW, a DVD-RAM or the like).;SOLUTION: The Ag alloy sputtering target has a component composition comprising, by mass, 0.1-3.0% Cu, 0.05-2.0% Ga, 0.001-0.1% Ca and the balance being Ag and inevitable impurities. The target has a flange 2 at the periphery of a target main body 1 and a Vickers hardness within a range of 40-70.;COPYRIGHT: (C)2009,JPO&INPIT
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