首页> 外国专利> HIGH HARDNESS Ag ALLOY SPUTTERING TARGET FOR FORMING REFLECTIVE FILM OF OPTICAL RECORDING MEDIUM

HIGH HARDNESS Ag ALLOY SPUTTERING TARGET FOR FORMING REFLECTIVE FILM OF OPTICAL RECORDING MEDIUM

机译:高硬度Ag合金溅射靶材,用于形成光学记录介质的反射膜

摘要

PROBLEM TO BE SOLVED: To provide an Ag alloy sputtering target for forming an Ag alloy reflective film of an optical recording medium (a CD-RW, a DVD-RAM or the like).;SOLUTION: The Ag alloy sputtering target has a component composition comprising, by mass, 0.1-3.0% Cu, 0.05-2.0% Ga, 0.001-0.1% Ca and the balance being Ag and inevitable impurities. The target has a flange 2 at the periphery of a target main body 1 and a Vickers hardness within a range of 40-70.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种用于形成光学记录介质(CD-RW,DVD-RAM等)的Ag合金反射膜的Ag合金溅射靶。该组合物包含按质量计0.1-3.0%的Cu,0.05-2.0%的Ga,0.001-0.1%的Ca,余量为Ag和不可避免的杂质。该靶在靶主体1的外围具有凸缘2,并且维氏硬度在40-70的范围内。;版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009024212A

    专利类型

  • 公开/公告日2009-02-05

    原文格式PDF

  • 申请/专利权人 MITSUBISHI MATERIALS CORP;

    申请/专利号JP20070187778

  • 发明设计人 MISHIMA TERUSHI;KOMIYAMA SHOZO;

    申请日2007-07-19

  • 分类号C23C14/34;G11B7/26;C22C5/06;C22F1/14;C22F1/00;

  • 国家 JP

  • 入库时间 2022-08-21 19:40:30

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