首页> 外文期刊>Transactions of the Magnetics Society of Japan >The Recording of Tiny Marks Less Than 100 nm on Magneto-optical Medium Sputtered from RE-TM Alloy Target
【24h】

The Recording of Tiny Marks Less Than 100 nm on Magneto-optical Medium Sputtered from RE-TM Alloy Target

机译:从RE-TM合金靶溅射的磁光介质上记录小于100 nm的微小标记

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Use of magneto-optical (MO) medium sputtered from an intermetallic compound alloy target has advantages for mass production but may not be suitable for high-density recording due to its poor perpendicular magnetic anisotropy. The relationship between MsHc, the product of saturation magnetization Ms and coercivity Hc, and film microstructure is discussed in this paper; we obtained a' MsHc of 1.3 X 10~6 erg/cm~3 using microcolumnar structure even when the medium was sputtered from an alloy target. By adopting this film for the memory layer in a DWDD system, tiny marks less than 100 nm in size can be reliably written. As a result, high-density recording at 15 Gbit/inch~2 is achieved.
机译:使用从金属间化合物合金靶溅射的磁光(MO)介质具有批量生产的优势,但由于其垂直磁各向异性差,可能不适用于高密度记录。本文讨论了MsHc,饱和磁化强度Ms和矫顽力Hc的乘积与薄膜微观结构之间的关系。即使从合金靶溅射出介质,我们也可以使用微柱结构获得1.3 X 10〜6 erg / cm〜3的MsHc。通过将该膜用作DWDD系统中的存储层,可以可靠地写入小于100 nm的微小标记。结果,实现了15 Gbit / inch〜2的高密度记录。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号