SALT FOR ACID GENERATOR OF CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION, METHOD FOR PRODUCING THE SAME AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a salt which become an acid generator providing a chemically amplified resist composition capable of forming a pattern having good pattern form and exhibiting high resolving power.;SOLUTION: The present invention provides a salt represented by formula (I) (wherein Q¹ and Q² each independently represent a fluorine atom or a 1-6C perfluoroalkyl group; T represents a methylene group or a carbonyl group; U¹, U² and U³ are mutually independently a hydrogen atom, a 1-4C alkyl group, a 1-4C alkoxy group, a hydroxy group, a hydroxymethyl group or a cyano group or U¹ and U² may together exhibit an oxo group, with the proviso that U¹, U² and U³ are not simultaneously hydrogen atoms; A⁺ represents an organic pair ion).;COPYRIGHT: (C)2009,JPO&INPIT