The device which includes the gas pipe line which is separated plasma promotion chemical vapor phase vapor deposition method of internal barrier layer inside the container (PECVD) by, the solenoid valve of for the sake of

摘要

This invention the container (2) the device for PEVCD of the thin film of the material which possesses the barrier effect inside regards (1). The aforementioned device as for (1), the electromagnetic wave supply system (11) equipping, it receives the container (2), the processor which (4) and the precusor gas inlet (17) with, the container (2) the bottom edge which appears to inside (14) and the apex edge which opposes (15) possessing the injector in order to introduce aforementioned precusor gas into the container (13) with, the precusor gas inlet (17) with the injector (13) the apex edge (15) the precusor gas supply line which establishes the fluid connection between (20) with, the supply line (20), the precusor insideThe gas inlet (17) with the injector (13) the injector (13) the apex edge (15) the solenoid valve which is placed in the immediately place high-level (25) with, it has in between.