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The atomic layer evaporation and the new tantalum complex of the tantalum content film which uses the surface activator
The atomic layer evaporation and the new tantalum complex of the tantalum content film which uses the surface activator
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机译:使用表面活化剂的钽含量薄膜的原子层蒸发和新型钽配合物
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摘要
The atomic layer vapor deposition method which makes the tantalum content film form on the surface is offered. In the vapor deposition method which it discloses also the new tantalum complex which can use as the tantalum precusor is offered.
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