In the image correction device which generates the amendment pattern image the image correction device, the pattern survey instrument,

摘要

PROBLEM TO BE SOLVED: To provide image correction and pattern inspection similarly effective even for an extremely sparse pattern image to a dense pattern image in a pattern inspection device such as a reticle inspection device.;SOLUTION: The invention provides an image correction device that is equipped with: a pattern cutting section to cut out a pattern as a paste pattern from each region of an inspection reference pattern image and an objective inspection pattern image where the pattern is present; a pattern pasting section to paste the paste pattern in an empty region where no pattern is present in each of the inspection reference pattern image and the objective inspection pattern image to produce a pasted inspection reference pattern image and a pasted objective inspection pattern image; a simultaneous equation generating section to generate a simultaneous equation from a linear prediction model on the pasted inspection reference pattern image and the pasted objective inspection pattern image; a parameter generating section to solve the simultaneous equation to obtain model parameters; and a corrected pattern image generating section to apply the linear prediction model using the model parameters on the pattern image to generate a corrected pattern image.;COPYRIGHT: (C)2007,JPO&INPIT