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Reticle conveyer and exposure device, management method of reticle conveying method, processing method, device production method, and reticle cover of reticle
Reticle conveyer and exposure device, management method of reticle conveying method, processing method, device production method, and reticle cover of reticle
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机译:掩模版输送机和曝光装置,掩模版输送方法的管理方法,处理方法,设备制造方法以及掩模版的掩模版罩
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摘要
The reticle conveyer which can prevent the fact that the foreign material comes in contact with the reticle is offered.After the reticle is carried by the reticle carrying mechanism 4 which carries the reticle which is covered the territory where the reticle pattern is formed at least in the reticle conveyer 4 which conveys the reticle vis-a-vis processing atmosphere chamber 3, by the cover to processing atmosphere chamber 3 and reticle carrying mechanism 4, it has with the cover cleaning mechanism 10 which cleans the cover which is carried out by the cover carrying out mechanism 4 which carries out the cover which is separated from the reticle from the processing atmosphere chamber and cover carrying out mechanism 4.
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