首页> 外国专利> Reticle conveyer and exposure device, management method of reticle conveying method, processing method, device production method, and reticle cover of reticle

Reticle conveyer and exposure device, management method of reticle conveying method, processing method, device production method, and reticle cover of reticle

机译:掩模版输送机和曝光装置,掩模版输送方法的管理方法,处理方法,设备制造方法以及掩模版的掩模版罩

摘要

The reticle conveyer which can prevent the fact that the foreign material comes in contact with the reticle is offered.After the reticle is carried by the reticle carrying mechanism 4 which carries the reticle which is covered the territory where the reticle pattern is formed at least in the reticle conveyer 4 which conveys the reticle vis-a-vis processing atmosphere chamber 3, by the cover to processing atmosphere chamber 3 and reticle carrying mechanism 4, it has with the cover cleaning mechanism 10 which cleans the cover which is carried out by the cover carrying out mechanism 4 which carries out the cover which is separated from the reticle from the processing atmosphere chamber and cover carrying out mechanism 4.
机译:提供一种能够防止异物与掩模版接触的掩模版输送机。在掩模版由掩模版运送机构4运送之后,掩模版运送机构4运送掩模版,该掩模版至少覆盖掩模版图案形成区域。掩模版搬送装置4具有将掩模版相对于处理气氛室3搬送至处理气氛室3和掩模版搬送机构4的掩模版搬送装置4,其具有罩清洁机构10,该罩清扫机构10对由罩罩搬出的罩进行清扫。罩搬出机构4,该罩搬出机构4从处理气氛室搬出与掩模版分离的罩和罩搬出机构4。

著录项

  • 公开/公告号JPWO2007074757A1

    专利类型

  • 公开/公告日2009-06-04

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20070551949

  • 发明设计人 山本 一;

    申请日2006-12-25

  • 分类号H01L21/027;G03F1/16;G03F1/14;

  • 国家 JP

  • 入库时间 2022-08-21 19:37:24

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