SYSTEMS, METHODS, AND DEVICES FOR THERMAL CONDITIONINGS OF RETICLES IN LITHOGRAPHIC APPARATUSES

摘要

Embodiments herein describe systems, methods, and devices for thermal conditioning of reticles at a patterning device handling apparatus and a support structure in lithographic apparatuses. A patterning device handling apparatus includes a gripping device with a plurality of pneumatic lines. The patterning device handling apparatus positions a first surface of a patterning device below the gripping device, and the gripping device applies a first air How to the patterning device using the plurality of pneumatic lines. The patterning device handling apparatus positions a second surface of the patterning device in the support structure. One or more vacuum pads in clamping interfaces in the support structure apply a second air How to the patterning device. The first and second air flows result in thermal conditioning of the patterning device.