首页>
外国专利>
REFLECTIVE MASK BLANK FOR EXPOSURE, REFLECTIVE MASK FOR EXPOSURE, METHOD OF PRODUCING A SEMICONDUCTOR DEVICE, AND SUBSTRATE PROVIDED WITH MULTILAYER REFLECTIVE FILM
REFLECTIVE MASK BLANK FOR EXPOSURE, REFLECTIVE MASK FOR EXPOSURE, METHOD OF PRODUCING A SEMICONDUCTOR DEVICE, AND SUBSTRATE PROVIDED WITH MULTILAYER REFLECTIVE FILM
展开▼
机译:反射面膜空白,反射面膜空白,生产半导体器件的方法,以及带有多层反射膜的基材
展开▼
页面导航
摘要
著录项
相似文献
摘要
To provide a reflective mask blank for exposure that can solve a problem of adsorption failure in fixing a reflective mask using an electrostatic chuck and thus can flatten the surface of the mask using the electrostatic chuck, thereby realizing high-accuracy pattern transfer. In a reflective mask blank for exposure having a multilayer reflective film formed on a board and adapted to reflect exposure light and an absorbent layer formed on the multilayer reflective film and adapted to absorb the exposure light, the shape of a surface of the mask blank on its side opposite to its transfer pattern forming surface is a shape having a convex surface.
展开▼