Mask Blank Substrate, Substrate with Multilayer Reflective Film, Reflective Mask Blank, Reflective Mask, Method for Producing Substrate for Mask Blank, Method for Producing Substrate with Multilayer Reflective Film, and Manufacturing Method of Semiconductor Device

摘要

It is an object of the present invention to provide a mask blank substrate or the like which can reliably detect critical defects due to a small number of detections including false defects even in a high sensitivity defect inspection machine using light of various wavelengths . The present invention relates to a mask blank substrate used for lithography, wherein a region of 0.14 mm 0.1 mm on the main surface on the side on which a transfer pattern of the substrate for mask blank is formed is covered with a white interferometer , A spatial frequency detected at a pixel number of 640 480 1 10^-2m^-1Not less than 1 m^-1The power spectral density is 4 10⁶Nm⁴Or less, and the spatial frequency detected in the 1 m 1 m region is 1 m^-1The power spectral density of 10 nm⁴Or less, and a mask blank substrate.